Foundries are finally in production with EUV lithography at 7nm, but chip customers must now decide whether to implement their next designs using EUV-based multiple patterning at 5nm/3nm or wait for a ...

Continuing to rely on 193nm immersion lithography with multiple patterning is becoming much more difficult at 7nm and 5nm. With the help of various resolution enhancement techniques, optical ...

Beaten, bruised, and a bit smarter than it was on opening day, the old buck slowly moves from his bed. The sun just set, but he’s not anywhere close to a big field yet. Keeping it in low gear, the ...

The past decade has witnessed the rapid development of a broad range of strategies used to pattern polymers. Intense interest in polymer patterning originated from the diversity of existing synthetic ...

As major foundries announce the release of their 1.0 versions of 20 nm processes, we now see IC designers moving to production design and implementation of integrated circuits at this node. For many ...

Double patterning is a class of technologies developed for photolithography to enhance the feature density of computer chips. The resolution of a photoresist pattern begins to blur at around 45 nm ...

Researchers have introduced a novel technique that allows for the direct patterning of two-dimensional (2D) semiconductor materials onto substrates without the need for complex processes. The ...

Figure 8 compares the starting input (a) to the final manufactured shapes from SADP/SAQP (b) and SALELE (c) processes. The final manufactured patterns in SADP/SAQP have extensive extra dummy metal.