Atomic layer deposition (ALD) originated from atomic layer epitaxy, which was introduced in 1970 and initially used in electroluminescent displays. It rapidly revolutionized semiconducting ...

Designed for demanding semiconductor applications, the UltiDry combines robust performance with high energy efficiency ...

Making films one molecular layer at a time might seem like painstaking work limited to laboratories researching esoteric surface science. But it’s not. Atomic layer deposition (ALD), a layer-at-a-time ...

The Dutch spatial atomic layer deposition equipment manufacturer has launched a new sheet-to-sheet tool for pilot production of large area perovskite solar devices on glass substrates.

Atomic layer deposition (ALD) is a bottom-up nanofabrication deposition method that technically falls within the remit of chemical vapor deposition (CVD) methods; but it has become well-regarded as a ...

Forge Nano's breakthrough changes that equation completely by simultaneously delivering 1000:1 aspect ratio conformality, ALD-quality film uniformity and speed. This is one of the rare semiconductor ...

A manufacturing technique capable of depositing atomically thin layers of aluminum oxide is reshaping the market for industrial equipment to produce state of the art photovoltaic cells. Manufacturers ...

Researchers have designed and demonstrated a new optical component that could significantly enhance the brightness and image quality of augmented reality (AR) glasses. The advance brings AR glasses a ...