SAN MATEO, Calif. — Michael Stabenfeldt, a chip designer and tool architect who has had a long and controversial career developing tools for companies like Cadence and ArcSys (now Avanti Corp.), has ...

SAN DIEGO, Nov. 23, 2021 (GLOBE NEWSWIRE) -- GBT Technologies Inc. (OTC PINK: GTCHD) ("GBT” or the “Company”), is developing a nanometer range EDA tool that visually advises and eliminates design rule ...

In this paper, the authors discuss the design of an Integrated Circuit (IC) layout for a decoder. The layout was designed by using an open source software namely electric VLSI design system as the ...

SpringSoft Completes OpenAccess-Compatible IC Layout Flow with Enhancements to Laker ADP Design Entry System The Laker™ Advanced Design Platform integrates the full-featured Laker schematic editor, ...

SAN DIEGO, June 22, 2021 (GLOBE NEWSWIRE) -- GBT Technologies Inc. (OTC PINK: GTCH ) ("GBT” or the “Company”), filed a provisional patent application for Integrated Circuits automatic design rule ...

Ireland-based IC Mask Design is offering a range of training courses on IC layout aimed at all levels of expertise which focus on the development of physical design skills. The ‘Master-IC’ courses, ...

SANTA CRUZ, Calif. — Claiming the first automated design for manufacturability (DFM) capability “designed for designers,” Silicon Canvas announced a new set of DFM features for its Laker custom IC ...

Layout for ICs at process geometries of 90 nm and below becomes a very dicey affair. Even at 180 nm, the number of design rules that must be enforced for an ASIC or system-on-a-chip to be ...

Targeted to provide a robust interactive design environment for early detection and elimination of IC’s layout design rule violations. SAN DIEGO, Nov. 23, 2021 (GLOBE NEWSWIRE) -- GBT Technologies Inc ...

HSINCHU, Taiwan--(BUSINESS WIRE)--SpringSoft, Inc., a global supplier of specialized IC design software, today announced the availability of the latest version of its Laker™ Advanced Design Platform ...

The technology aims for significant reduction of microchip’s layout design cycle; particularly, in advanced nanometer ranges, 7nm and below, enabling faster chip’s design and manufacturing cycle SAN ...