Chemical Vapor Deposition (CVD) is a widely used technique in materials science, particularly in the fabrication of thin films and coatings, as well as the synthesis of advanced materials. It involves ...

Copper’s resistivity depends on its crystal structure, void volume, grain boundaries and material interface mismatch, which becomes more significant at smaller scales. The formation of copper (Cu) ...

In organic optoelectronic devices, the control of molecular deposition on thin films is important for optimal surface arrangement and device performance. In a recent study, researchers developed a new ...

AI-driven process monitoring enhances the qualification of additively manufactured stainless-steel parts. By analysing high-frequency welding current and voltage signals in both the time and frequency ...

Atomic layer deposition (ALD) used to be considered too slow to be of practical use in semiconductor manufacturing, but it has emerged as a critical tool for both transistor and interconnect ...

Aerosol deposition (AD) methods have emerged as a transformative approach for fabricating both thin and thick films entirely at room temperature. By utilising aerosolised powders propelled onto ...